MKS AX7670-06-R

High Efficiency and Output

The MKS AX7670-06-R is designed to provide high reactant output, making it suitable for large chamber configurations and increased performance. It supports continuous operation and is not duty cycle limited。

Versatile Gas Compatibility

The generator supports a variety of gases, including NF3, C3F8, and CF4, making it versatile for different reactive gas applications。

Compact and Robust Design

The MKS AX7670-06-R features a compact design with a lid-mountable remote plasma source, making it easy to integrate into existing systems. It is designed for robust operation with minimal maintenance。
Manufacturer:
Part number: MKS AX7670-06-R
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Description

Detailed Parameter Table

Parameter Name Parameter Value
Product Model MKS AX7670-06-R
Manufacturer MKS Instruments
Product Category Reactive Gas Generator
Type Remote Plasma Source
Gas Flow Rate Up to 3.0 slm NF3
Operating Pressure 1-10 Torr
Ignition Gas Compatible with existing process gases
Wetted Materials 6061-T6 Aluminum hardcoat anodized, Chemraz®, Alumina
Control Interface Ethernet, RS232
Dimensions 16.7” L x 14.5” W x 10.1” H (424 x 368 x 26 mm nominal)
Weight 74 lb. (33.5 kg)
Certifications CE, SEMI S2-0200, SEMI F47
MKS AX7670-06-R

MKS AX7670-06-R

Product Introduction

The MKS AX7670-06-R is a high-output reactive gas generator designed for chamber cleaning and other reactive gas applications. It is part of the ASTRON® ex series, known for its patented Low-Field-Toroidal plasma technology that efficiently dissociates input gases to produce downstream reactive chemistries。

Core Advantages and Technical Highlights

High Efficiency and Output

The MKS AX7670-06-R is designed to provide high reactant output, making it suitable for large chamber configurations and increased performance. It supports continuous operation and is not duty cycle limited。

Versatile Gas Compatibility

The generator supports a variety of gases, including NF3, C3F8, and CF4, making it versatile for different reactive gas applications。

Compact and Robust Design

The MKS AX7670-06-R features a compact design with a lid-mountable remote plasma source, making it easy to integrate into existing systems. It is designed for robust operation with minimal maintenance。

MKS AX7670-06-R

MKS AX7670-06-R

Typical Application Scenarios

The MKS AX7670-06-R is widely used in:
  • Semiconductor Manufacturing: For CVD chamber clean, FPD chamber clean, photoresist bulk ash, oxidation, nitridation, and abatement。
  • Research and Development: For high-flux reactive gas applications in laboratory settings。
  • Industrial Processes: For cleaning deposits from interior walls of process chambers using alternative gases。

Related Model Recommendations

  • MKS AX7670-06: A related model with similar specifications but different gas flow capabilities。
  • MKS AX7690: A higher-end model with enhanced features and capabilities。

Installation, Commissioning, and Maintenance Instructions

Installation Preparation

Ensure the environment meets the specified temperature and humidity requirements. Use appropriate tools and safety equipment to secure the generator in place. Connect the input and output cables according to the manufacturer’s guidelines。

Maintenance Suggestions

Regularly inspect the generator for signs of wear or damage. Keep the unit clean and free from dust to prevent overheating and ensure efficient operation。
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