ZYGO 7702 | ZMI™ Series Dual-Frequency Laser Head for Nanoscale Metrology

Description

ZYGO 7702: Product Overview​

1. Frequency Stabilization: Delivers a two-frequency laser output with minimal frequency drift, ensuring the accuracy of displacement calculations in interferometers.
2. Beam Quality Maintenance: Provides a collimated, polarized laser beam with low noise, critical for maintaining the integrity of interference patterns.

• Dual-Frequency Output: Emits two orthogonally polarized frequencies (e.g., f1 and f2) to enable heterodyne interferometry, a technique that achieves sub-nanometer resolution by measuring frequency differences between the reference and measurement beams.
• Compact Design: Features a rugged, compact enclosure (6 mm beam diameter) suitable for integration into space-constrained metrology systems.
• Compatibility: Works seamlessly with ZYGO’s ZMI™ 240X and 4X04 series measurement boards, as well as third-party interferometer systems that support dual-frequency laser inputs.

• Reliability: Industrial-grade components and a robust design ensure 24/7 operation in cleanroom environments (e.g., semiconductor fabs).
• Scalability: Can be combined with multiple laser heads to enable multi-axis displacement measurements, making it suitable for applications like wafer stage positioning in semiconductor manufacturing.
• Ease of Integration: Compatible with existing ZYGO measurement systems, reducing setup time and effort for engineers.

  

  ZYGO 7702

Technical Specifications​

• Model Number: 7702 (ZMI 7702)
• Manufacturer: ZYGO (AMETEK)
• Product Type: Dual-Frequency Helium-Neon Laser Head
• Laser Medium: Helium-Neon (HeNe)
• Wavelength: 632.8 nm (±0.1 nm)
• Output Power: >650 μW (typical)
• Beam Diameter: 6 mm (nominal)
• Polarization: Collinear, orthogonally linear polarized
• Operating Temperature: 20°C ± 0.1°C (water-cooled for enhanced stability)
• Weight: 12 kg (26.5 lbs)
• Certifications: CE, UL (inferred from ZYGO industrial product standards)

Core Features & Customer Value​

Compared to other high-stability laser sources, the 7702 offers a cost-effective solution for customers who need dual-frequency laser output for interferometric measurements. Its compatibility with ZYGO’s measurement boards also reduces the need for additional hardware, further lowering costs.

ZYGO 7702

Typical Applications​

1. Semiconductor Manufacturing:
   • Wafer Stage Positioning: Provides the laser source for interferometric systems that position wafers with nanometer-scale accuracy during lithography. For example, in a 7nm semiconductor fab, the 7702 enables the positioning of wafers to within 0.1 nm of the target position, ensuring that the lithographic pattern is printed correctly.
   • Mask Alignment: Used in mask alignment systems to ensure that the photomask is positioned accurately relative to the wafer, preventing defects in the printed circuit.
2. Optical Manufacturing:
   • Lens Testing: Enables the measurement of lens surface figure and wavefront aberrations with sub-nanometer resolution. For example, in the production of high-power laser lenses, the 7702 is used to verify that the lens surface is free of defects that could degrade laser performance.
   • Optical Component Metrology: Used to measure the thickness and refractive index of optical components (e.g., glass wafers, prisms) with high precision.
3. Nanotechnology:
   • Atomic Force Microscopy (AFM): Provides the laser source for AFM systems that image surfaces at the atomic scale. The 7702’s high stability ensures that the AFM’s cantilever deflection measurements are accurate, enabling researchers to study nanomaterials with unprecedented detail.
   • Nanopositioning: Used in nanopositioning systems to control the movement of stages with nanometer-scale resolution, enabling applications like single-molecule manipulation and nanoassembly.