ZYGO 7702

Description

Product Description

• Multi-Axis Support: Capable of driving up to 16 measurement axes with a single laser source, reducing system complexity and cost.
• High Stability: Vacuum wavelength stability of ±0.01 ppm over 24 hours ensures long-term measurement consistency.
• Compact Design: With dimensions of 100 mm x 80 mm x 60 mm and a weight of 5.5 kg, it is easily integrated into space-constrained setups.
• Fast Start-Up: Laser light output is achieved within 10 seconds, minimizing downtime in critical operations.

Product Parameters

Parameter	Specification
Laser Type	Helium-Neon (HeNe), continuous wave (CW)
Wavelength	632.8 nm
Output Power	>400 µW (nominal)
Beam Diameter	3–6 mm (adjustable)
Frequency Stability	±0.01 ppm/24 hours
Beam Pointing Stability	<0.1 arcsec/°C
Operating Temperature	10°C to 30°C (non-condensing)
Power Supply	100–240V AC, 50/60Hz
Interfaces	USB 2.0 for control and data transfer

ZYGO 7702

Advantages and Features

1. Ultra-Precision Measurement:
   The 7702 achieves sub-nanometer resolution (<0.1 nm) with noise-limited performance, making it suitable for applications such as EUV lithography and atomic force microscopy.
2. Flexible Configuration:
   Its modular design allows integration with ZYGO’s differential interferometers (e.g., DPMI) and measurement boards (e.g., 4104C), enabling customization for specific metrology needs.
3. Low Cyclic Error:
   Engineered to minimize cyclic errors (≤1 nm), it outperforms competitors with cyclic errors up to 10–20 nm, ensuring reliable measurements over large travel ranges.
4. Energy Efficiency:
   Low-power standby mode reduces energy consumption by 30% compared to legacy systems, ideal for 24/7 industrial operations.
5. Robust Design:
   Built with industrial-grade components, it withstands vibrations and thermal fluctuations, ensuring long-term reliability in harsh environments.

Application Areas and Use Cases

• Semiconductor Manufacturing: Controlling wafer stages in lithography tools to achieve nanometer-scale alignment.
• Aerospace and Defense: Positioning adaptive optics in telescopes and targeting systems for high-precision imaging.
• Research Laboratories: Characterizing nano-positioners and driving closed-loop control in scanning probe microscopy experiments.

Competitor Comparison

• Higher Stability: ±0.01 ppm wavelength stability vs. typical ±0.05 ppm in competing systems.
• Wider Beam Adjustability: 3–6 mm beam diameter supports diverse optical configurations.
• Faster Start-Up: 10-second activation time compared to 30–60 seconds in legacy systems.
  

  ZYGO 7702

Selection Recommendations

1. System Compatibility: Ensure your control system supports USB 2.0 for seamless integration.
2. Precision Requirements: Verify the module’s resolution and stability align with your application’s accuracy needs.
3. Environmental Conditions: Confirm the operating temperature (10°C–30°C) and humidity levels match your setup.
4. Expansion Needs: Leverage its multi-axis capability to scale systems without additional laser sources.

Precautions

1. Installation:
   • Mount the laser head in a vibration-isolated environment to maintain beam stability.
   • Use shielded cables for signal connections to minimize electromagnetic interference (EMI).
2. Operation:
   • Avoid direct exposure to the laser beam to prevent eye injury.
   • Do not exceed the rated output power to protect connected optics.
3. Maintenance:
   • Clean optical surfaces quarterly using lint-free wipes and ethanol.
   • Regularly update firmware via ZYGO’s Control Suite to access performance optimizations.