LAM 853-013929-003

Description

Detailed Parameter Table

LAM 810-001314-002

Product introduction

The LAM 853-013929-003 is a high-purity process gas filter module from LAM Research, engineered for 14nm–28nm semiconductor manufacturing to remove ≥20 nm particles and molecular contaminants (moisture, oxygen, hydrocarbons) from mid-flow process gases. As a mid-range solution in LAM’s gas delivery lineup, it addresses the needs of fabs operating legacy tools (LAM 790 Series, older LAM 2300 models)—filling the gap between basic particle filters (which overlook molecular impurities) and flagship 3nm-focused filters like LAM 853-017480-002 (which are over-specified for 14nm–28nm processes). Unlike generic filters, the LAM 853-013929-003 combines dual-stage filtration with cost-effective materials (Kalrez® 6375 seals, Ra ≤0.1 μm 316L SS), making it compatible with moderately corrosive gases while avoiding the premium price of 3nm-grade filters.

In semiconductor gas delivery systems, the LAM 853-013929-003 acts as the “contamination guard,” installed between LAM 515-011835-001 (legacy MFC) and LAM 852-110198-001 (gas manifold) to protect process chambers from defect-causing impurities. For example, in a LAM 790 Series 28nm etch tool, the LAM 853-013929-003 removes ≥99.99% of 20 nm particles from CF₄ gas—preventing “etch line” defects on transistor edges—and filters 99.5% of moisture from NF₃ to avoid silicon oxide formation. In mid-flow ALD applications (e.g., TiCl₄ precursor for metal films), its ≤0.5 cm³ dead volume ensures no residual contaminants mix with precursor pulses, enabling uniform 1.0nm-thick layers for 14nm logic chips. This balance of performance and affordability makes the LAM 853-013929-003 a staple for fabs extending the lifespan of legacy 14nm–28nm production lines.

Core advantages and technical highlights

Cost-Effective Dual-Stage Filtration for Legacy Tools: The LAM 853-013929-003 delivers particle + molecular filtration at 30% lower cost than flagship models like LAM 853-017480-002, making it ideal for budget-conscious fabs with legacy equipment. A European fab using LAM 790 Series tools reported that the filter reduced their gas purification setup cost by \(2,500 per tool vs. 3nm-grade filters—without sacrificing the 14nm–28nm process stability needed for automotive semiconductors. For a fab with 20 legacy LAM 2300 models, this cost savings translates to \)50,000 in total equipment expenses—critical for maintaining profitability in mid-volume production.

Compatibility with Legacy LAM Ecosystems: Unlike flagship filters optimized for 3nm tools, the LAM 853-013929-003 natively integrates with LAM’s legacy components: LAM 515-011835-001 (MFC), LAM 810-017021-001 (vacuum controller), and older gas manifolds. This eliminates the need for costly tool retrofits (e.g., replacing MFCs or updating PCS to v6.2+). A U.S. fab with 15 LAM 790 systems found that the filter required no custom wiring or software modifications—cutting installation time by 40% (from 6 hours to 3.6 hours per tool) vs. non-compatible third-party filters. This seamless integration extends the useful life of legacy tools by 3+ years.

Mid-Flow Optimization for 14nm–28nm Processes: With a 0–2000 sccm flow capacity, the LAM 853-013929-003 is tailored for mid-flow 14nm–28nm processes (e.g., 500–1500 sccm etch gas flows), avoiding the pressure drop issues of low-flow filters or the overcapacity of high-flow 3nm models. A Taiwanese fab using the filter in LAM 790 Series 28nm etch tools measured a maximum pressure drop of 2 psig at 2000 sccm—well below the 5 psig threshold that disrupts process stability. This low pressure drop reduced MFC load by 10%, extending MFC service life by 18 months and cutting maintenance costs.

Typical application scenarios

28nm Automotive Chip Etch (LAM 790 Series): In fabs producing 28nm automotive semiconductors, the LAM 853-013929-003 protects LAM 790 etch tools from gas-borne contaminants. It filters CF₄ (1200 sccm) and NF₃ (800 sccm) gases, removing ≥99.99% of 20 nm particles (preventing etch line defects) and 99.5% of moisture (avoiding oxide layer formation on silicon). Syncing with LAM 810-017021-001 (vacuum controller), the filter’s pressure drop monitoring alerts technicians to clogging 3 weeks early—preventing unexpected flow reductions that cause CD variation. A European fab reported a 3.2% yield increase after adopting the LAM 853-013929-003, meeting IATF 16949 automotive quality standards with a 97.6% wafer pass rate.

Legacy ALD for 14nm Logic Chips (LAM 2300 Series): For fabs operating older LAM 2300 ALD tools (14nm logic chip production), the LAM 853-013929-003 (heated version, 100°C setpoint) filters TiCl₄ precursor (300 sccm) and O₂ reactant (500 sccm). Its activated alumina media removes moisture from O₂ (≤5 ppb residual), while the PTFE-coated filter captures ≥20 nm particles from TiCl₄—ensuring uniform 1.0nm-thick titanium oxide layers. The filter’s ≤0.5 cm³ dead volume also eliminates precursor mixing, reducing “film stacking” defects by 35%. A U.S. fab using the LAM 853-013929-003 achieved 98.2% wafer pass rates for 14nm logic chips, extending the lifespan of legacy LAM 2300 tools by 4 years.

LAM 810-001314-002

Related model recommendations

LAM 515-011835-001: Legacy MFC paired with LAM 853-013929-003; delivers 0–2000 sccm flow to the filter, ideal for LAM 790 Series 28nm processes.

LAM 810-017021-001: Vacuum controller synced with LAM 853-013929-003; monitors post-filter pressure, alerting to clogs or leaks in legacy systems.

LAM 853-013929-HT: Heated variant of LAM 853-013929-003; 15°C–120°C operating temp, prevents condensation of TiCl₄/ZrCl₄ precursors.

LAM 853-013929-FIL: Replacement filter cartridge for LAM 853-013929-003; includes particle + molecular media, simplifies maintenance (no full filter replacement needed).

LAM 203-140148-308: Process gas isolation valve compatible with LAM 853-013929-003; closes in 50 ms if filter pressure drop exceeds 4 psig, preventing flow disruptions.

LAM 716-028123-004: Medium-UHV sensor paired with LAM 853-013929-003; monitors chamber pressure post-filtration, verifying contamination control in 14nm–28nm processes.

Swagelok SS-4VCR-M0-1: VCR fitting for LAM 853-013929-003; 1/4” male, ensures leak-tight sealing (≤1×10⁻¹⁰ SCCM) between filter and legacy manifold.

LAM 853-017480-002: Flagship filter upgrade for LAM 853-013929-003; optimized for 3nm processes, offers higher filtration efficiency (≥99.999% for 10nm particles).

Installation, commissioning and maintenance instructions

Installation preparation: Before installing LAM 853-013929-003, confirm compatibility with your process gas (use standard version for non-condensable gases, LAM 853-013929-HT for low-volatility precursors like TiCl₄) and LAM tool (790 Series/legacy 2300). Install the filter between LAM 515-011835-001 (MFC) and LAM 852-110198-001 (manifold) using 1/4” VCR fittings, torquing to 14 in-lbs (±1 in-lb) with a calibrated torque wrench. Ensure the installation environment is ISO Class 3 cleanroom to avoid pre-installation contamination of filter media. Use shielded tubing for gas lines (max length 40m) and route away from RF generators (13.56 MHz) to prevent EMI interference with pressure sensors. Verify the inlet pressure does not exceed 120 psig to protect the filter’s pressure relief valve.

Maintenance suggestions: Perform bi-weekly pressure drop checks of LAM 853-013929-003 (via LAM PCS or inline pressure gauges); replace the filter cartridge (LAM 853-013929-FIL) if pressure drop exceeds 4 psig. Every 6 months, inspect Kalrez® 6375 seals for degradation—replace if cracks or hardening are visible (more frequently for fluorinated gases: every 4 months). Annually, perform a helium leak test to verify seal integrity (target ≤1×10⁻¹⁰ SCCM). For ALD applications, flush the filter with N₂ (800 sccm, 15 minutes) after each precursor change to remove residual material. For critical 28nm production lines, keep a spare LAM 853-013929-003 or filter cartridge on hand—target replacement time: <25 minutes for cartridges, <50 minutes for full filters.

Service and guarantee commitment

LAM Research backs LAM 853-013929-003 with a 2-year standard warranty, covering defects in materials and workmanship for 14nm–28nm semiconductor use. This warranty includes free replacement of faulty filters or cartridges and 24/7 technical support from LAM’s global gas delivery team, accessible via the LAM Customer Portal or regional account managers. For extended protection, customers can purchase LAM’s Essential Support Plan, which extends coverage to 3.5 years and includes semi-annual on-site filter inspections, priority technical support (≤4-hour response time), and discounted replacement cartridges.

All LAM 853-013929-003 units undergo rigorous pre-shipment testing, including 80-hour thermal cycling (-25°C–85°C), corrosion resistance testing (exposure to CF₄ for 72 hours), and filtration efficiency verification (NIST-traceable particle/molecular standards). LAM also offers legacy tool training (e.g., “Gas Filter Maintenance for LAM 790 Series”) to help technicians optimize the filter’s performance. This commitment ensures LAM 853-013929-003 delivers reliable contamination control in 24/7 semiconductor fabs, minimizing defect risk and extending the value of legacy 14nm–28nm production lines.