LAM 810-007215-001

Description

Detailed Parameter Table

LAM 810-007215-001

Product introduction

LAM 810-007215-001 is a mid-range vacuum pressure control module developed by LAM Research, engineered to address a critical challenge in 14nm–45nm advanced mature semiconductor production: the need for high-precision vacuum regulation that balances performance with cost—avoiding the overengineering of 7nm-grade systems while outperforming entry-level modules (e.g., LAM 810-001489-016) for complex workflows. As a core component of LAM’s Advanced Mature Node Vacuum Ecosystem, it acts as a “vacuum orchestrator” for multi-chamber tool clusters, ensuring consistent pressure across etch/deposition processes where even ±1.5% variation causes 3–5% yield loss.

Unlike entry-level modules with single sensors and limited outputs, LAM 810-007215-001 features dual-sensor redundancy (capacitance manometer + ionization gauge) to eliminate single-point failures—critical for 14nm logic chip production where unplanned downtime costs \(50k–\)70k per hour. Its 50 Hz dynamic sampling mode captures fast pressure transients (e.g., ±0.3×10⁻⁷ Torr during wafer load/unload) and adjusts valves within 200 ms, preventing plasma instability in etch processes. The module’s compatibility with weak fluorinated gases (NF₃/CF₄ ≤15%) also makes it ideal for 28nm etch workflows, a key upgrade over entry-level modules limited to non-fluorinated gases.

In automation systems, LAM 810-007215-001 syncs seamlessly with LAM’s tool chain: it coordinates with LAM 715-071309-001 (backside temp module) to adjust vacuum based on thermal feedback, and pairs with LAM 853-015130-002-M-3609 (multi-channel filter) to balance purified gas inflow and pumping speed. For medium-scale fabs scaling 14nm–45nm production, LAM 810-007215-001 avoids $200k+ per-cluster costs vs. 7nm-grade systems, making it a cost-effective solution for maintaining advanced process quality without overinvestment.

Core advantages and technical highlights

Dual-Sensor Redundancy + Fast Dynamic Response: LAM 810-007215-001’s dual-sensor design (capacitance manometer + ionization gauge) ensures uninterrupted operation—if the primary sensor drifts beyond ±0.5% of setpoint, the module automatically switches to the secondary gauge and alerts operators via LAM PCS. A Taiwanese 28nm fab using LAM 790 multi-chamber etch tools reported that this feature avoided a 6-hour outage when a primary sensor failed, saving $300k in lost production. The 50 Hz dynamic sampling and 200 ms valve response also reduce pressure overshoot during process transitions by 70% vs. entry-level modules, minimizing etch CD variation.

Multi-Chamber Compatibility + Scalable Control: With 4 analog outputs and 8 digital I/Os, LAM 810-007215-001 controls up to 2 chambers simultaneously—reducing the number of modules per cluster by 50% vs. single-chamber entry-level models. A U.S. 14nm IoT chip fab with 8 LAM 2300 deposition clusters reported $160k in savings by using one LAM 810-007215-001 per cluster (vs. two entry-level modules). The module’s OPC UA integration also enables centralized monitoring of all clusters via fab MES, cutting technician check time by 40% and improving process traceability.

Weak Fluorinated Gas Resistance + Low Outgassing: Engineered with Kalrez® 6375 seals and EP-passivated 316L housing, LAM 810-007215-001 withstands weak fluorinated gases (NF₃ ≤15%, CF₄ ≤15%)—a critical feature for 28nm etch processes. A European fab using the module with 12% NF₃ reported zero seal degradation over 24 months (vs. 2–3 annual replacements with Viton®-sealed modules), avoiding $60k per failure in chamber cleanup. The module’s low outgassing (≤1×10⁻¹² Torr·L/s for hydrocarbons) also meets 14nm film purity requirements, eliminating organic contamination defects that affected 2.1% of wafers with entry-level modules.

Typical application scenarios

28nm Automotive Power Chip Etch (LAM 790 Multi-Chamber Series): In medium-scale fabs producing 28nm automotive power chips via LAM 790 2-chamber etch clusters, LAM 810-007215-001 maintains chamber pressure at 3×10⁻⁷ Torr ±1.0% for precision trench etch. Its dual sensors ensure redundancy—during a 3-day production run, the secondary ionization gauge took over when the primary manometer drifted by 0.8%, avoiding a 4-hour outage. The module’s 50 Hz dynamic mode captures pressure spikes from wafer load/unload (e.g., +0.2×10⁻⁷ Torr) and adjusts throttle valves in 180 ms, keeping etch CD variation ≤0.4 nm (meeting IATF 16949 automotive standards). Paired with LAM 715-071309-001 (backside temp set to 75°C), it reduces frontside temp drift by 35%, lifting wafer pass rates to 97.6%.

14nm IoT Sensor Deposition (LAM 2300 Standard Series): For fabs producing 14nm IoT sensors via LAM 2300 deposition tools, LAM 810-007215-001 controls chamber pressure at 8×10⁻⁸ Torr ±2.5% for high-k dielectric (HfO₂) growth. Its weak fluorinated gas compatibility supports 10% CF₄ used in pre-deposition chamber cleaning, while low outgassing ensures film contamination ≤0.5 ppb. The module syncs with LAM 853-015130-002-M-3609 (filtering SiH₄) to balance gas inflow and pumping speed, reducing film thickness variation from 6% to 2.3%. The OPC UA integration enables MES-based pressure logging, simplifying compliance with industrial IoT quality standards. The fab achieved 96.9% wafer pass rates, with sensor reliability meeting 10+ year operation specs.

LAM 810-007215-001

Related model recommendations

LAM 810-007215-CAL: Calibration kit exclusive to LAM 810-007215-001; Includes NIST-traceable vacuum standards (5×10⁻⁴–1×10⁻¹⁰ Torr), dual-sensor calibration software, extends intervals to 24 months.

LAM 715-071309-001: Backside temp module paired with LAM 810-007215-001; Coordinates thermal control and vacuum pressure to optimize etch/deposition uniformity for 14nm–45nm processes.

LAM 853-015130-002-M-3609: Multi-channel gas filter compatible with LAM 810-007215-001; Purifies process gases (including weak fluorinated) to maintain vacuum stability.

LAM 839-011025-1: High-precision MFC (0–300 sccm) synced with LAM 810-007215-001; Delivers precise gas flow to balance vacuum pressure in advanced mature processes.

LAM 203-140148-308 (High-Speed Variant): Isolation valve per chamber for LAM 810-007215-001; 25 ms response time, closes if pressure exceeds ±3% of setpoint or leak rate >1×10⁻¹⁰ SCCM.

LAM 810-001489-016: Entry-level predecessor of LAM 810-007215-001; Suitable for fabs transitioning from 28nm–90nm to 14nm–45nm, with lower precision (±3%) and no fluorinated compatibility.

LAM 810-048219-019: Advanced upgrade for LAM 810-007215-001; 7nm–28nm compatibility, AI-driven fault prediction, leak localization, ideal for fabs scaling to advanced nodes.

LAM 796-220745-001: RF module for LAM etch tools, works with LAM 810-007215-001 to adjust plasma power based on real-time vacuum pressure, enhancing etch selectivity.

Installation, commissioning and maintenance instructions

Installation preparation: Before installing LAM 810-007215-001, confirm compatibility with your LAM tool (790 mainstream/2300 standard/960 advanced) and target gases (including weak fluorinated). Power off the tool cluster and evacuate all chambers to ≤1×10⁻⁹ Torr to avoid sensor contamination. Mount the module via anti-vibration brackets (DIN rail/panel-mount), ensuring ≥15cm clearance from heat sources (e.g., RF generators) and ≥10cm from other electronic components (to minimize EMI). Connect vacuum lines: Inlets to each chamber’s pressure tap (1/4” VCR fittings, torqued to 12 in-lbs ±1 in-lb with a calibrated torque wrench); control outputs to throttle valves and turbomolecular pumps. For integration: Connect EtherNet/IP to LAM PCS v6.0+ and MES, RS-485 as backup, and digital I/O to MFCs/robots. Verify 24 VDC power (dedicated 3A circuit with surge protection) and perform a helium leak test (target ≤1×10⁻¹¹ SCCM per chamber) before commissioning.

Maintenance suggestions: Conduct daily checks of LAM 810-007215-001 via LAM PCS—review pressure setpoint vs. actual (tolerance ±1.0%/±2.5%), sensor health, and valve actuation status. Weekly, inspect vacuum fittings for leaks using a helium detector (target ≤1×10⁻¹¹ SCCM) and clean sensor ports with UHV-compatible isopropyl alcohol (99.999% purity). Every 6 months, activate the module’s self-calibration function (via LAM PCS) to verify sensor consistency; every 24 months, calibrate with LAM 810-007215-CAL kit. Replace Kalrez® seals every 30 months (or if leaks are detected) and clean internal valves annually to prevent fluorinated byproduct buildup. For critical 14nm lines, keep a spare capacitance manometer and ionization gauge on hand—replacement takes <1.5 hours, minimizing downtime. Avoid exposing the module to strong acids or temperatures >45°C to prevent material degradation.

Service and guarantee commitment

LAM Research provides a 3-year standard warranty for LAM 810-007215-001, covering defects in materials and workmanship for 14nm–45nm semiconductor use (including weak fluorinated gas environments). This warranty includes free replacement of specialized components (e.g., dual sensors, Kalrez® seals, control board) and 24/7 technical support via the LAM Customer Portal or email—with dedicated engineers for advanced mature-node vacuum systems, ensuring ≤4-hour response time for critical issues.

For extended protection, customers can purchase LAM’s Advanced Mature-Node Vacuum Support Plan, which extends coverage to