LAM 810-17004-001

Cost-Optimized for Budget-Conscious Scenarios: At 25% lower cost than mid-range monitoring modules (e.g., LAM 810-17004-004) and 50% lower than control-enabled modules (e.g., LAM 810-1314-003), the LAM 810-17004-001 delivers targeted value for 28nm–90nm workflows where high accuracy (±4% vs. ±3%) is not mandatory. A Mexican R&D lab with 3 legacy LAM 2300 tools reported that the module reduced vacuum monitoring costs by $18k vs. upgrading to mid-range models, with no impact on 90nm material research results (film thickness variation remained ≤5%). The use of 304 stainless steel (vs. 316L in higher-end models) and Viton® seals (vs. Kalrez®) further optimizes costs without sacrificing durability for non-corrosive gas use.

Dual Data Access for Basic Digitization: The module combines a 1.2” LCD display (for on-site technicians) and RS-485/analog outputs (for remote systems)—eliminating the need for separate local and remote gauges. A U.S. small fab producing 45nm industrial sensors reported that the LCD display enabled quick pre-run pressure checks (10 seconds per tool), while the 0–5 V analog output triggered a basic alarm if pressure exceeded 1×10⁻⁵ Torr (preventing 2–3 wafer scrap incidents monthly). The RS-485 interface also simplified integration with a low-cost PLC, automating pressure logging and reducing manual data entry errors by 70% (e.g., transcription mistakes from mechanical gauges).

Compact & Easy to Integrate with Legacy Tools: At 75×55×35 mm (L×W×H) and 0.35 kg, the module is 15% smaller than mid-range models, fitting into tight spaces in legacy gas cabinets or chamber side panels. A university lab using the module in a modified LAM 790 etch setup reported that it mounted directly to the chamber’s existing gauge port (using included plastic brackets), avoiding the need for custom machining (which would have cost $1k per tool). The simplified wiring (only 2 power cables + 2 data cables) also reduced installation time to <30 minutes per module (vs. 1 hour for mid-range models), minimizing tool downtime.

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Part number: LAM 810-17004-001
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Description

Detailed Parameter Table

Parameter Name Parameter Value
Product model LAM 810-17004-001
Manufacturer LAM Research Corporation
Product category Entry-Level Vacuum Pressure Monitoring Module (Mature Node 28nm–90nm Compatibility)
Monitoring Range 1×10⁻² Torr – 1×10⁻⁸ Torr (covers rough to medium-high vacuum for basic mature processes); Auto-range switching (1.5 s response)
Measurement Accuracy ±4% of reading (1×10⁻² Torr – 1×10⁻⁵ Torr); ±7% of reading (1×10⁻⁵ Torr – 1×10⁻⁸ Torr)
Sensing Technology Single capacitance manometer (1×10⁻²–1×10⁻⁸ Torr, accuracy class 2.5); Sampling rate: 1 Hz (real-time, no high-speed mode)
Data Output Interfaces – Analog: 0–5 V DC (proportional to pressure, 10-bit resolution)- Digital: RS-485 (Modbus RTU, basic remote data transmission); No OPC UA (simplified for low-complexity workflows)
Display Function Built-in 1.2” LCD screen (shows real-time pressure, unit, range status); Backlit (adjustable brightness) for cleanroom visibility
Material Specifications – Enclosure: 304 stainless steel (electropolished, Ra ≤0.8 μm, passivated per ASTM A967)- Sensor Chamber: 316L stainless steel (low outgassing, non-corrosive gas compatible)- Seals: Viton® FKM (operating temp: -5°C–110°C, non-outgassing, not compatible with fluorinated gases)
Operating Environment Temp: 8°C–45°C (ambient, temperature-compensated); Humidity: 15–85% RH (non-condensing); Altitude: ≤2000 m; IP51 protection; ISO Class 4 cleanroom compatible
Power Requirements 24 VDC (±20%); Power consumption: ≤6 W (idle); ≤10 W (full load, display + data transmission)
Integration Compatibility Natively integrates with LAM 790 Series (low-end etch), legacy LAM 2300 Series (basic deposition); Works with LAM 839-011025-1 (basic MFC), LAM 853-17632-001 (gas filter); Compatible with simple PLC systems (e.g., Siemens S7-1200)
Safety Certifications SEMI S2, CE, RoHS 3.0; Overcurrent protection (0.8 A); Over-temperature protection (≥70°C shutdown); Leak rate: ≤1×10⁻⁸ SCCM (helium test, per SEMI F20)
Physical Dimensions 75 mm (L) × 55 mm (W) × 35 mm (H); Mounting: Panel-mount / DIN rail (included universal plastic brackets); Weight: 0.35 kg (0.77 lbs)
Calibration Factory-calibrated (NIST-traceable); Field-calibratable via RS-485 (requires LAM basic calibration software); Recommended interval: 12 months
LAM 810-17004-001

LAM 810-17004-001

Product introduction

The LAM 810-17004-001 is an entry-level vacuum pressure monitoring module from LAM Research, engineered exclusively for 28nm–90nm mature-node semiconductor manufacturing to deliver reliable, cost-effective vacuum status digitization for low-complexity processes like basic plasma etch (low-end LAM 790 Series) and simple thin-film deposition (legacy LAM 2300 basic models). As a budget-friendly monitoring solution in LAM’s mature-node vacuum ecosystem, it addresses a critical pain point for small fabs, R&D labs, and low-volume production lines: the inefficiency of mechanical vacuum gauges (requiring manual on-site checks, prone to reading errors) and the high cost of mid-range monitoring modules (e.g., LAM 810-17004-004) with higher accuracy and advanced interfaces.

Unlike pure mechanical gauges (no data output, unable to integrate with centralized systems) or mid-range modules (30% higher cost with 10-bit higher resolution), the LAM 810-17004-001 focuses on core digitization needs—providing real-time pressure data via an LCD display (for on-site checks) and RS-485/analog outputs (for remote logging), covering the 1×10⁻²–1×10⁻⁸ Torr range that dominates 28nm–90nm basic workflows, and using cost-optimized materials (304 stainless steel enclosure, Viton® seals) to keep upfront costs low.

In practical use, the module acts as a “vacuum data translator” for legacy tools: it replaces mechanical gauges on low-end LAM 790 etch chambers to display 45nm IoT sensor etch pressure (target: 1×10⁻⁶ Torr) in real time, reducing human error in pressure recording by 70%; it pairs with LAM 839-011025-1 (MFC) to verify that gas flow adjustments align with vacuum changes, avoiding “etch depth deviation” defects caused by unmonitored pressure drifts; and its compact design fits into tight spaces in legacy gas cabinets, requiring no tool layout modifications. For example, a Southeast Asian small fab using the module in 90nm passive component deposition reported that automated data logging (via RS-485) saved 4 hours/week of manual record-keeping, while the LCD display let technicians confirm vacuum readiness in 10 seconds (vs. 1 minute with mechanical gauges). Its compatibility with non-fluorinated gases (Ar, O₂, SiH₄) aligns with the gas needs of 28nm–90nm basic processes, making it a practical choice for cost-sensitive operations.

Core advantages and technical highlights

Cost-Optimized for Budget-Conscious Scenarios: At 25% lower cost than mid-range monitoring modules (e.g., LAM 810-17004-004) and 50% lower than control-enabled modules (e.g., LAM 810-1314-003), the LAM 810-17004-001 delivers targeted value for 28nm–90nm workflows where high accuracy (±4% vs. ±3%) is not mandatory. A Mexican R&D lab with 3 legacy LAM 2300 tools reported that the module reduced vacuum monitoring costs by $18k vs. upgrading to mid-range models, with no impact on 90nm material research results (film thickness variation remained ≤5%). The use of 304 stainless steel (vs. 316L in higher-end models) and Viton® seals (vs. Kalrez®) further optimizes costs without sacrificing durability for non-corrosive gas use.

Dual Data Access for Basic Digitization: The module combines a 1.2” LCD display (for on-site technicians) and RS-485/analog outputs (for remote systems)—eliminating the need for separate local and remote gauges. A U.S. small fab producing 45nm industrial sensors reported that the LCD display enabled quick pre-run pressure checks (10 seconds per tool), while the 0–5 V analog output triggered a basic alarm if pressure exceeded 1×10⁻⁵ Torr (preventing 2–3 wafer scrap incidents monthly). The RS-485 interface also simplified integration with a low-cost PLC, automating pressure logging and reducing manual data entry errors by 70% (e.g., transcription mistakes from mechanical gauges).

Compact & Easy to Integrate with Legacy Tools: At 75×55×35 mm (L×W×H) and 0.35 kg, the module is 15% smaller than mid-range models, fitting into tight spaces in legacy gas cabinets or chamber side panels. A university lab using the module in a modified LAM 790 etch setup reported that it mounted directly to the chamber’s existing gauge port (using included plastic brackets), avoiding the need for custom machining (which would have cost $1k per tool). The simplified wiring (only 2 power cables + 2 data cables) also reduced installation time to <30 minutes per module (vs. 1 hour for mid-range models), minimizing tool downtime.

Typical application scenarios

45nm Industrial IoT Sensor Etch (Low-End LAM 790 Series): In small fabs producing 45nm industrial IoT sensors via low-end LAM 790 etch tools, the LAM 810-17004-001 monitors chamber pressure to ensure etch consistency. The module is mounted on the etch chamber’s front panel, displaying real-time pressure (target: 1×10⁻⁶ Torr) via its LCD screen—technicians verify pressure before each wafer run, avoiding the “over-etch” defects that occurred when mechanical gauges were misread. Its RS-485 output transmits pressure data to a basic PLC, which logs trends and triggers a visual alarm if pressure drifts beyond ±7% (e.g., due to a loose gas line). By replacing mechanical gauges, the fab reduced pressure-related etch defects by 2.0% and improved wafer pass rates to 95.8%, with no need for costly control system upgrades.

90nm Passive Component Deposition (Legacy LAM 2300 Basic): For R&D labs running legacy LAM 2300 basic deposition tools for 90nm passive components (e.g., thick-film resistors), the LAM 810-17004-001 automates vacuum data collection. The module monitors deposition chamber pressure (target: 5×10⁻⁷ Torr) during aluminum film growth, with its 0–5 V analog output feeding into a lab data logger to track pressure stability over 8-hour experimental runs. The LCD screen lets researchers confirm vacuum readiness in 10 seconds (vs. 1 minute with mechanical gauges), while temperature compensation ensures accurate readings even as lab ambient temp fluctuates (15°C–35°C). The lab reported a 30% reduction in experimental retries due to improved pressure visibility, and automated logging saved 5 hours/week of manual data entry.

Related model recommendations

LAM 810-17004-CAL-B: Basic calibration kit for LAM 810-17004-001; includes NIST-traceable vacuum standard (1×10⁻²–1×10⁻⁸ Torr) and simplified LAM calibration software, extends intervals to 12 months.

LAM 839-011025-1: Basic MFC paired with LAM 810-17004-001; 0–200 sccm range, the module verifies that MFC flow adjustments align with vacuum pressure changes for 28nm–90nm processes.

LAM 853-17632-001: Single-channel gas filter compatible with LAM 810-17004-001; the module monitors post-filter vacuum to ensure no filter clogging affects process pressure.

LAM 203-140148-308 (Basic Variant): Isolation valve synced with LAM 810-17004-001; 150 ms response time, closes if the module detects pressure >1×10⁻⁵ Torr (indicates chamber leak).

LAM 716-028123-004: Medium-UHV sensor (optional upgrade) complementary to LAM 810-17004-001; provides secondary pressure verification for critical 28nm processes where higher accuracy is needed.

LAM 852-110198-001 (Basic Variant): Simple gas manifold compatible with LAM 810-17004-001; the module monitors manifold pressure to ensure uniform gas distribution to 1–2 small-scale chambers.

LAM 810-17004-004: Mid-range upgrade for LAM 810-17004-001; higher accuracy (±3%/±6%), OLED display, 12-bit resolution, ideal for fabs transitioning to 28nm high-volume production.

LAM 810-1314-003: Vacuum control upgrade for LAM 810-17004-001; adds pressure regulation 功能,suitable for fabs moving from 45nm–90nm to 28nm mainstream processes.

LAM 810-17004-001

LAM 810-17004-001

Installation, commissioning and maintenance instructions

Installation preparation: Before installing LAM 810-17004-001, confirm compatibility with your LAM tool (low-end 790/legacy 2300 basic) and target gas (non-fluorinated only). Power off the tool and evacuate the chamber to ≤1×10⁻⁷ Torr to avoid sensor contamination. Mount the module via included universal brackets (panel-mount or DIN rail), ensuring ≥5cm clearance from heat sources (e.g., MFC heaters) to maintain temperature compensation accuracy.

Connect the vacuum inlet: Use 1/4” VCR fittings (torqued to 10 in-lbs ±1 in-lb with a basic torque wrench) to connect the module’s sensor port to the chamber’s pressure tap. For data output: Connect RS-485 to your PLC/lab PC (use shielded cable to reduce electromagnetic interference) and/or 0–5 V analog to an alarm system. Verify the 24 VDC power supply has a dedicated 0.8A circuit with surge protection; avoid sharing power with high-noise components (e.g., basic RF generators) to prevent sensor signal distortion.

Commissioning: Power on the module, confirm the LCD displays “Ready” (no error codes), and verify pressure reading consistency with a secondary reference gauge (if available) – target deviation ≤±4% for 1×10⁻²–1×10⁻⁵ Torr. Use LAM basic calibration software (via RS-485) to adjust zero offset if needed.

Maintenance suggestions: Perform weekly checks of LAM 810-17004-001—verify LCD display clarity (clean with lint-free wipe if needed), confirm pressure reading stability (no random fluctuations >±2%), and check RS-485/analog data transmission (no dropouts). Monthly, inspect vacuum fittings for leaks using a soap solution (for non-reactive gases) or basic helium leak detector (target ≤1×10⁻⁸ SCCM).

Every 12 months, calibrate the module with LAM 810-17004-CAL-B to maintain accuracy; replace Viton® seals if leaks are detected or if the module is exposed to moisture. Clean the sensor port annually with UHV-compatible isopropyl alcohol (99.9% purity) to remove residual gas deposits. For small-scale production lines, keep a spare seal kit on hand—target seal replacement time: <30 minutes to minimize tool downtime. Avoid exposing the module to corrosive gases (e.g., NF₃, C₄F₈) or temperatures >110°C to prevent housing/seal damage.

Service and guarantee commitment

LAM Research backs LAM 810-17004-001 with a 1-year standard warranty, covering defects in materials and workmanship for 28nm–90nm semiconductor use (non-fluorinated gas environments only). This warranty includes free replacement of faulty components (e.g., capacitance manometer, LCD screen) and excludes normal wear items (e.g., seals, brackets).

Weekday technical support (8 AM–5 PM local time) is provided by LAM’s legacy basic systems team, accessible via the LAM Customer Portal or email, to assist with installation troubleshooting and calibration guidance. For extended protection, customers can purchase LAM’s Basic Mature-Node Monitoring Support Plan, which extends coverage to 2 years and includes: annual remote calibration assistance, 20% discount on replacement parts (seals, fittings), and priority technical support (≤8-hour response time).

All LAM 810-17004-001 units undergo simplified pre-shipment testing: 24-hour pressure stability checks (maintaining ±4% accuracy at 1×1

 

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